UNIVERISTY of WISCONSIN-MADISON

Department of Chemistry

College of Letters & Science
Tue, 07/22/2014 - 3:21pm -- aandrea
TitleResist Free Patterning of Nonpreferential Buffer Layers for Block Copolymer Lithography
Publication TypeJournal Article
Year of Publication2010
AuthorsHan, E, Leolukman, M, Kim, M, Gopalan, P
JournalACS Nano
Volume4
Pagination6527-6534
ISBN Number1936-0851
Accession Number2010:1311688